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DALLAEVA, D. PROKOPYEVA, E. TOMÁNEK, P. GRMELA, L. RAMAZANOV, S.
Originální název
Interferometry and Atomic force microscopy of substrates for optoelectronics proceeded by dry plasma etching
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
The paper describes the process of sapphire and silicon carbide substrates preparation by dry plasma etching and its characterization. The study confirms the possibility of using dry plasma etching processes for wide band gape materials treatment, since the condition of the substrate surface is an important parameter for electronic and optoelectronic devices manufacturing. Processed substrates were studied by interferometry to define the etch depth, and by atomic force microscopy to study the topography and statistical analysis of surface roughness before and after etching. The interferometry reveals the dependence of etch rate on the angle between the substrates and defocused beam of argon ions. It is also shown in low scale image that the surface damage occurs after the substrate treatment. But the common large area surface topography indicates the decreasing of roughness. In order to have purely physical etching the argon plasma was used. Thus this combination of methods allows determine optimal conditions of the substrate preparation.
Klíčová slova
etching; sapphire; silicon carbide; substrate; interferometry; atomic force microscopy
Autoři
DALLAEVA, D.; PROKOPYEVA, E.; TOMÁNEK, P.; GRMELA, L.; RAMAZANOV, S.
Rok RIV
2014
Vydáno
5. 11. 2014
Nakladatel
IEEE Computer Society Press
Místo
Los Alamitos, CA, USA
ISBN
978-1-4799-6666-0
Kniha
2014 International Symposium on Optomechatronic Technologies (ISOT 2014)
ISSN
1063-6900
Periodikum
Proceedings. The Computer Security Foundations Workshop III
Ročník
Číslo
1
Stát
Spojené státy americké
Strany od
283
Strany do
287
Strany počet
5
BibTex
@inproceedings{BUT110784, author="Dinara {Sobola} and Elena {Prokopyeva} and Pavel {Tománek} and Lubomír {Grmela} and Shihgasan {Ramazanov}", title="Interferometry and Atomic force microscopy of substrates for optoelectronics proceeded by dry plasma etching", booktitle="2014 International Symposium on Optomechatronic Technologies (ISOT 2014)", year="2014", journal="Proceedings. The Computer Security Foundations Workshop III", volume="2014", number="1", pages="283--287", publisher="IEEE Computer Society Press", address="Los Alamitos, CA, USA", doi="10.1109/ISOT.2014.76", isbn="978-1-4799-6666-0", issn="1063-6900" }