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MACH, J. PROCHÁZKA, P. BARTOŠÍK, M. NEZVAL, D. PIASTEK, J. HULVA, J. ŠVARC, V. KONEČNÝ, M. KORMOŠ, L. ŠIKOLA, T.
Originální název
Electronic transport properties of graphene doped by gallium
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
In this work we present the effect of low dose gallium (Ga) deposition (<4ML) performed in UHV (10−7 Pa) on the electronic doping and charge carrier scattering in graphene grown by chemical vapor deposition. In situ graphene transport measurements performed with a graphene field-effect transistor structure show that at low Ga coverages a graphene layer tends to be strongly n-doped with an efficiency of 0.64 electrons per one Ga atom, while the further deposition and Ga cluster formation results in removing electrons from graphene (less n-doping). The experimental results are supported by the density functional theory calculations and explained as a consequence of distinct interaction between graphene and Ga atoms in case of individual atoms, layers, or clusters.
Klíčová slova
graphene, gallium, CVD, DFT, transport, doping
Autoři
MACH, J.; PROCHÁZKA, P.; BARTOŠÍK, M.; NEZVAL, D.; PIASTEK, J.; HULVA, J.; ŠVARC, V.; KONEČNÝ, M.; KORMOŠ, L.; ŠIKOLA, T.
Vydáno
13. 10. 2017
ISSN
0957-4484
Periodikum
NANOTECHNOLOGY
Ročník
28
Číslo
41
Stát
Spojené království Velké Británie a Severního Irska
Strany od
1
Strany do
10
Strany počet
URL
https://pubmed.ncbi.nlm.nih.gov/28813368/
BibTex
@article{BUT139482, author="Jindřich {Mach} and Pavel {Procházka} and Miroslav {Bartošík} and David {Nezval} and Jakub {Piastek} and Jan {Hulva} and Vojtěch {Švarc} and Martin {Konečný} and Lukáš {Kormoš} and Tomáš {Šikola}", title="Electronic transport properties of graphene doped by gallium", journal="NANOTECHNOLOGY", year="2017", volume="28", number="41", pages="1--10", doi="10.1088/1361-6528/aa86a4", issn="0957-4484", url="https://pubmed.ncbi.nlm.nih.gov/28813368/" }