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ŠIK, O. BÁBOR, P. POLČÁK, J. BELAS, E. MORAVEC, P. GRMELA, L. STANĚK, J.
Originální název
Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
We have investigated the properties of the Te-rich surface layer formed after a bromine-methanol etch of CdTe single crystal by two methods: Angle Resolved X-Ray Photoelectron Spectroscopy (ARXPS) and Low Energy Ion Scattering (LEIS) in the Dynamic mode. We compare the acquisition time of each method. The results showed similar, exponential decay of the Te/Cd ratio to a depth of 6 nm. At the depths higher than 6 nm, the substrate becomes stoichiometric. Dynamic LEIS provided more detailed information about composition at depths lower than the probing depth of ARXPS. The Dynamic LEIS measurements suggest that the composition of the outermost layer of CdTe after bromine-methanol etching consists of CdTe4.
Klíčová slova
CdTe; Bromine methanol etching; Thin films; Depth profile; Stoichiometry; Surface analysis; ARXPS; Dynamic LEIS
Autoři
ŠIK, O.; BÁBOR, P.; POLČÁK, J.; BELAS, E.; MORAVEC, P.; GRMELA, L.; STANĚK, J.
Vydáno
13. 3. 2018
Nakladatel
PERGAMON-ELSEVIER SCIENCE LTD
Místo
THE BOULEVARD, LANGFORD LANE, KIDLINGTON, OXFORD OX5 1GB, ENGLAND
ISSN
0042-207X
Periodikum
Vacuum
Číslo
152
Stát
Spojené království Velké Británie a Severního Irska
Strany od
138
Strany do
144
Strany počet
7
URL
https://www.sciencedirect.com/science/article/pii/S0042207X17314653
BibTex
@article{BUT146607, author="Ondřej {Šik} and Petr {Bábor} and Josef {Polčák} and Eduard {Belas} and Pavel {Moravec} and Lubomír {Grmela} and Jan {Staněk}", title="Low Energy Ion Scattering as a depth profiling tool for thin layers - Case of bromine Methanol etched CdTe", journal="Vacuum", year="2018", number="152", pages="138--144", doi="10.1016/j.vacuum.2018.03.014", issn="0042-207X", url="https://www.sciencedirect.com/science/article/pii/S0042207X17314653" }