Detail publikace

The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning

GLOSS, J. HORKÝ, M. KŘIŽÁKOVÁ, V. FLAJŠMAN, L. SCHMID, M. URBÁNEK, M. VARGA, P.

Originální název

The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

We have studied the growth of metastable face-centered-cubic, non-magnetic Fe78Ni22 thin films on silicon substrates. These films undergo a magnetic (paramagnetic to ferromagnetic) and structural (fcc to bcc) phase transformation upon ion beam irradiation and thus can serve as a material for direct writing of magnetic nanostructures by the focused ion beam. So far, these films were prepared only on single-crystal Cu(1 0 0) substrates. We show that transformable Fe78Ni22 thin films can also be prepared on a hydrogen-terminated Si(1 0 0) with a 130-nm-thick Cu(1 0 0) buffer layer. The H-Si(1 0 0) substrates can be prepared by hydrofluoric acid etching or by annealing at 1200 degrees C followed by adsorption of atomic hydrogen. The Cu(1 0 0) buffer layer and Fe78Ni22 fcc metastable thin film were deposited by thermal evaporation in ultra-high vacuum. The films were consequently transformed in-situ by 4 keV Ar+ ion irradiation and ex-situ by a 30 keV Ga+ focused ion beam, and their magnetic properties were studied by magneto-optical Kerr effect magnetometry. The substitution of expensive copper single crystal substrate by standard silicon wafers dramatically expands application possibilities of metastable paramagnetic thin films for focused-ion-beam direct magnetic patterning.

Klíčová slova

Magnetic nanostructures; Metastable films; fcc Fe; Cu buffer layer; Si(100)

Autoři

GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P.

Vydáno

1. 3. 2019

Nakladatel

Elsevier

ISSN

0169-4332

Periodikum

Applied Surface Science

Ročník

469

Číslo

1

Stát

Nizozemsko

Strany od

747

Strany do

752

Strany počet

6

URL

https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub

Plný text v Digitální knihovně

http://hdl.handle.net/11012/180697

BibTex

@article{BUT155301,
  author="Jonáš {Gloss} and Michal {Horký} and Viola {Křižáková} and Lukáš {Flajšman} and Michael {Schmid} and Michal {Urbánek} and Peter {Varga}",
  title="The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning",
  journal="Applied Surface Science",
  year="2019",
  volume="469",
  number="1",
  pages="747--752",
  doi="10.1016/j.apsusc.2018.10.263",
  issn="0169-4332",
  url="https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub"
}