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ČECH, V., ZEMEK, J., PEŘINA, V., VANĚK, J.
Originální název
Chemical properties of plasma-polymerized vinyltriethoxysilane
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Plasma-polymerized thin films of vinyltriethoxysilane were deposited on IR-transparent silicon wafers using plasma-enhanced chemical vapor deposition. Deposited films were characterized by spectroscopic techniques (RBS, ERDA, XPS, FTIR) in order to compare their elemental composition and chemical structure. We were able to influence/control the elemental composition and chemical structure of the plasma polymer films in relatively wide ranges by increasing the effective power.
Klíčová slova
PE CVD; thin film; organosilicon; FTIR; RBS; ERDA; XPS
Autoři
Rok RIV
2005
Vydáno
1. 8. 2005
Nakladatel
Conference Management, Toronto
Místo
Toronto, Kanada
Strany od
1
Strany do
5
Strany počet
BibTex
@inproceedings{BUT16049, author="Vladimír {Čech} and Jan {Vaněk} and Vratislav {Peřina} and Josef {Zemek}", title="Chemical properties of plasma-polymerized vinyltriethoxysilane", booktitle="Proc. 17th International Symposium on Plasma Chemistry", year="2005", pages="1--5", publisher="Conference Management, Toronto", address="Toronto, Kanada" }