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KLEDROWETZ, V. HÁZE, J. PROKOP, R. FUJCIK, L.
Originální název
An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
A novel active resistor circuit offering less sensitivity to process and temperature variations without any extra trimming is proposed. The circuit consists of two accurately matched, high resistance polysilicon (hripoly) resistors and a voltage-controlled MOS resistor, and it is designed for the industrial temperature range (-20 degrees C to 85 degrees C) in the TSMC 180 nm general-purpose process. The actual performance of the circuit is analyzed by using the Corner and Monte Carlo analyses that comprise two thousand samples for the global and local process variations. The maximum error in the resistor value is +/- 6.2%, with the standard deviation of sigma = 12%. The proposed active resistor reduces the maximum error from +/- 15% to +/- 6.2% when the both the process and the temperature variations are considered without trimming. As an application, a transconductor and a current reference based on the novel active resistor are introduced, and their accuracy-related performance is studied.
Klíčová slova
Active resistors; current reference; process variation; transconductor
Autoři
KLEDROWETZ, V.; HÁZE, J.; PROKOP, R.; FUJCIK, L.
Vydáno
29. 10. 2020
Nakladatel
IEEE
Místo
PISCATAWAY
ISSN
2169-3536
Periodikum
IEEE Access
Ročník
8
Číslo
1
Stát
Spojené státy americké
Strany od
197263
Strany do
197275
Strany počet
13
URL
https://ieeexplore.ieee.org/document/9244063
Plný text v Digitální knihovně
http://hdl.handle.net/11012/196478
BibTex
@article{BUT165887, author="Vilém {Kledrowetz} and Jiří {Háze} and Roman {Prokop} and Lukáš {Fujcik}", title="An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference", journal="IEEE Access", year="2020", volume="8", number="1", pages="197263--197275", doi="10.1109/ACCESS.2020.3034790", issn="2169-3536", url="https://ieeexplore.ieee.org/document/9244063" }