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STARÁ, V. PROCHÁZKA, P. PLANER, J. SHAHSAVAR, A. MAKOVEEV, A. SKÁLA, T. BLATNIK, M. ČECHAL, J.
Originální název
Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
Precise energy-level alignment between a metal electrode and an organic semiconductor is required to reduce contact resistance and enhance the efficiency of organic-semiconductor-based devices. Here, we introduce monolayer-thick charge-injection layers (CILs) based on aromatic carboxylic acids that can induce an energy-level shift in subsequent layers by up to 0.8 eV. Through a gradual chemical transformation of the as-deposited molecules, we achieve a highly tunable energy-level shift in the range of 0.5 eV. We reveal that the work function and energy-level positions in the CIL increase linearly with the density of induced dipoles. The energy-level position of subsequent layers follows the changes in the CIL. Our results thus connect the energy-alignment quantities, and the high tunability would allow precise tuning of the active layers deposited on the CIL, which marks a path towards efficient charge-injection layers on metal electrodes.
Klíčová slova
Alignment; Carboxylic acids; Semiconductor devices; Silver
Autoři
STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J.
Vydáno
1. 10. 2022
ISSN
2331-7019
Periodikum
Physical Review Applied
Ročník
18
Číslo
4
Stát
Spojené státy americké
Strany počet
13
URL
https://doi.org/10.1103/PhysRevApplied.18.044048
BibTex
@article{BUT182710, author="Veronika {Stará} and Pavel {Procházka} and Jakub {Planer} and Azin {Trllová Shahsavar} and Anton Olegovich {Makoveev} and Tomáš {Skála} and Matthias {Blatnik} and Jan {Čechal}", title="Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver", journal="Physical Review Applied", year="2022", volume="18", number="4", pages="13", doi="10.1103/PhysRevApplied.18.044048", issn="2331-7019", url="https://doi.org/10.1103/PhysRevApplied.18.044048" }