Detail publikace

Reactive Magnetron Sputtering for Passivation of Solar Cells

Ondřej Hégr, Jaroslav Boušek, Jaroslav Sobota, Radim Bařinka, Aleš Poruba

Originální název

Reactive Magnetron Sputtering for Passivation of Solar Cells

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.

Klíčová slova

magnetron sputtering, passivation layers, solar cells

Autoři

Ondřej Hégr, Jaroslav Boušek, Jaroslav Sobota, Radim Bařinka, Aleš Poruba

Rok RIV

2006

Vydáno

1. 1. 2006

Nakladatel

nakl. Z. Novotný

ISBN

80-214-3246-2

Kniha

IMAPS CS International Conference 2006, Proceedings

Číslo edice

1

Strany od

526

Strany do

529

Strany počet

4

BibTex

@inproceedings{BUT24907,
  author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}",
  title="Reactive Magnetron Sputtering for Passivation of Solar Cells",
  booktitle="IMAPS CS International Conference 2006, Proceedings",
  year="2006",
  volume="2006",
  number="1",
  pages="4",
  publisher="nakl. Z. Novotný",
  isbn="80-214-3246-2"
}