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Ondřej Hégr, Jaroslav Boušek, Jaroslav Sobota, Radim Bařinka, Aleš Poruba
Originální název
Reactive Magnetron Sputtering for Passivation of Solar Cells
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.
Klíčová slova
magnetron sputtering, passivation layers, solar cells
Autoři
Rok RIV
2006
Vydáno
1. 1. 2006
Nakladatel
nakl. Z. Novotný
ISBN
80-214-3246-2
Kniha
IMAPS CS International Conference 2006, Proceedings
Číslo edice
1
Strany od
526
Strany do
529
Strany počet
4
BibTex
@inproceedings{BUT24907, author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}", title="Reactive Magnetron Sputtering for Passivation of Solar Cells", booktitle="IMAPS CS International Conference 2006, Proceedings", year="2006", volume="2006", number="1", pages="4", publisher="nakl. Z. Novotný", isbn="80-214-3246-2" }