Detail publikace

Current density distribution, noise and non-linearity of thick film resistors

ŠIKULA, J., SEDLÁKOVÁ, V., GRMELA, L., VRBA, R., MELKES, F., ROCAK, D., BELAVIC, D., TACANO, M., HASHIGUCHI, S.

Originální název

Current density distribution, noise and non-linearity of thick film resistors

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The noise spectroscopy and third harmonic measurements were used to investigate effect of the contact electrode material on the thick film resistor quality and reliability. Strong dependence of nonlinearity on the contact electrode material wasobserved. Thick film resistors with AgPd contactelectrode have higher value of third harmonic voltage,but show better long term stability and reliabilitycomparing with resistors with Ag contact electrode.From the SEM figures we determined, that the sharpness of AgPd contact electrode is approximately 7deg, while Ag contact electrode sharpness is approx. 12deg. It was proved experimentally that noise spectraldensity is proportional to electric field intensity, whilethird harmonic voltage depends on the third power ofelectric field intensity or current density. Modelling ofthe current distribution for two different shapes of metallic contact cross sections was performed. The model shows that the electrode geometry plays dominant role for current distribution in thick film resistor layer. The higher sharpness of metallic contact, the higher current density peak appears in the vicinity of the contact edge. The value of noise or non-linearity is affected by the current density increase in the vicinity of contact - t is not necessary connected with irreversible processes at the contact interface.

Klíčová slova

Noise, Non-linearity, Current density, Thick film

Autoři

ŠIKULA, J., SEDLÁKOVÁ, V., GRMELA, L., VRBA, R., MELKES, F., ROCAK, D., BELAVIC, D., TACANO, M., HASHIGUCHI, S.

Rok RIV

2003

Vydáno

5. 4. 2003

Místo

U.S.A.

ISSN

0887-7491

Periodikum

Capacitor and Resistor Technology

Ročník

2003

Číslo

4

Stát

Spojené státy americké

Strany od

112

Strany do

116

Strany počet

5

BibTex

@inproceedings{BUT31988,
  author="Josef {Šikula} and Vlasta {Sedláková} and Lubomír {Grmela} and Radimír {Vrba} and František {Melkes} and Dubravka {Rocak} and Darko {Belavic} and Munecazu {Tacano} and Sumihisa {Hashiguchi}",
  title="Current density distribution, noise and non-linearity of thick film resistors",
  booktitle="23rd Capacitor and Resistor Technology Symposium",
  year="2003",
  journal="Capacitor and Resistor Technology",
  volume="2003",
  number="4",
  pages="5",
  address="U.S.A.",
  issn="0887-7491"
}