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ČECH, V. STUDÝNKA, J. JANOŠ, F. PEŘINA, V.
Originální název
Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Tetravinylsilane was used to deposit hydrogenated amorphous silicon carbide (a-SiC:H) films with vinyl groups as functional species using an RF (13.56 MHz) pulsed plasma. Oxygen gas was mixed in tetravinylsilane in order to improve compatibility of a SiOC:H thin films with silicon dioxide component. The oxygen-to-total flowrate ratio and effective power were the only variable deposition parameters. Deposited films were analyzed by Rutherford Backscattering Spectrometry, Elastic Recoil Detection Analysis, and infrared spectroscopy in order to determine elemental composition and chemical structure of the plasma polymer. The chemical structure of films was correlated with plasma species monitored by mass spectroscopy during the deposition process and the results clarified changes in chemical structure of films under influence of oxygen.
Klíčová slova
Glow discharge mass spectroscopy (GDMS); Infrared spectroscopy; Rutherford backscattering spectroscopy; PACVD; Plasma polymer
Autoři
ČECH, V.; STUDÝNKA, J.; JANOŠ, F.; PEŘINA, V.
Rok RIV
2007
Vydáno
13. 12. 2007
ISSN
1612-8850
Periodikum
Plasma Processes and Polymers
Ročník
4
Číslo
S1
Stát
Spolková republika Německo
Strany od
776
Strany do
780
Strany počet
5
BibTex
@article{BUT45130, author="Vladimír {Čech} and Jan {Studýnka} and Filip {Janoš} and Vratislav {Peřina}", title="Influence of oxygen on the chemical structure of plasma polymer films deposited from a mixture of tetravinylsilane and oxygen gas", journal="Plasma Processes and Polymers", year="2007", volume="4", number="S1", pages="776--780", issn="1612-8850" }