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SALYK, O. BROŽA, P. DOKOUPIL, N. HERRMANN, R. KUŘITKA, I. PRYČEK, J. WEITER, M.
Originální název
Plasma polymerisation of methylphenylsilane
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.
Klíčová slova
Polysilane; PMPS; Plasma deposition; Mass spectroscopy
Autoři
SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.
Rok RIV
2005
Vydáno
27. 9. 2005
Nakladatel
Elsevier
Místo
London
ISSN
0257-8972
Periodikum
Surface and Coatings Technology
Ročník
200
Číslo
1-4
Stát
Švýcarská konfederace
Strany od
486
Strany do
489
Strany počet
4
BibTex
@article{BUT46370, author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}", title="Plasma polymerisation of methylphenylsilane", journal="Surface and Coatings Technology", year="2005", volume="200", number="1-4", pages="486--489", issn="0257-8972" }