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OTTAVIANO, L. BUSSOLOTTI, F. PIPERNO, S. RINALDI, M. SANTUCCI, S. FLORA, F. MEZI, L. DUNNE, P. KAISER, J. REALE, A. RITUCCI, A., ZUPPELA, P.
Originální název
Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA poly(methyl methacrylate) preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO2/Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.
Klíčová slova
soft X-ray laser, interferometric litography, metallic micropatterns
Autoři
OTTAVIANO, L.; BUSSOLOTTI, F.; PIPERNO, S.; RINALDI, M.; SANTUCCI, S.; FLORA, F.; MEZI, L.; DUNNE, P.; KAISER, J.; REALE, A.; RITUCCI, A., ZUPPELA, P.
Rok RIV
2008
Vydáno
1. 5. 2008
ISSN
0963-0252
Periodikum
PLASMA SOURCES SCIENCE & TECHNOLOGY
Ročník
17
Číslo
2
Stát
Spojené království Velké Británie a Severního Irska
Strany od
24019
Strany do
24023
Strany počet
4
BibTex
@article{BUT48119, author="OTTAVIANO, L. and BUSSOLOTTI, F. and PIPERNO, S. and RINALDI, M. and SANTUCCI, S. and FLORA, F. and MEZI, L. and DUNNE, P. and KAISER, J. and REALE, A. and RITUCCI, A., ZUPPELA, P.", title="Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric litography", journal="PLASMA SOURCES SCIENCE & TECHNOLOGY", year="2008", volume="17", number="2", pages="24019--24023", issn="0963-0252" }