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OHLÍDAL, I. OHLÍDAL, M. NEČAS, D. FRANTA, D. BURŠÍKOVÁ, V.
Originální název
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.
Klíčová slova
Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry
Autoři
OHLÍDAL, I.; OHLÍDAL, M.; NEČAS, D.; FRANTA, D.; BURŠÍKOVÁ, V.
Rok RIV
2011
Vydáno
28. 2. 2011
Nakladatel
ELSEVIER SCIENCE SA
Místo
LAUSANNE
ISSN
0040-6090
Periodikum
Thin Solid Films
Ročník
519
Číslo
9
Stát
Nizozemsko
Strany od
2874
Strany do
2876
Strany počet
3
BibTex
@article{BUT50347, author="Ivan {Ohlídal} and Miloslav {Ohlídal} and David {Nečas} and Daniel {Franta} and Vilma {Buršíková}", title="Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry", journal="Thin Solid Films", year="2011", volume="519", number="9", pages="2874--2876", issn="0040-6090" }