Detail publikace

NDT of thick film resistors by noise spectroscopy

SEDLÁKOVÁ, V.

Originální název

NDT of thick film resistors by noise spectroscopy

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The noise spectroscopy measurements of thick-film resistors are proposed as a non-destructive testing method for the quality and reliability prediction and possible types of failure evaluation. The thick-film layer structure consists of metallic grains and inter-grain glass layers. Junctions between the metallic grains and glass layers are sources of noise and non-linearity. Important sources of noise are in the vicinity of defects and in the contact region. The main advantages of a noise testing are higher sensitivity than DC measurements during life tests. The kinds of noise spectra in view of reliability diagnostic are mainly the typical poor-device indicators like burst noise, generation-recombination noise, 1/f noise, and the 1/fa noise. The non-linearity of the thick-film layer structure is proportional to the distortion of the pure harmonic signal applied to the sample, and is connected with physical anomalies. The noise spectroscopy and non-linearity NDT can be used to adjust technology

Klíčová slova

noise, non-linearity, thick-film

Autoři

SEDLÁKOVÁ, V.

Rok RIV

2002

Vydáno

1. 1. 2002

Nakladatel

Ing. Zdeněk Novotný, CSc.

Místo

Brno

ISBN

80-214-2115-0

Kniha

Proceedings of 8th Conference STUDENT EEICT 2002

Číslo edice

1

Strany od

244

Strany do

248

Strany počet

5

BibTex

@inproceedings{BUT5729,
  author="Vlasta {Sedláková}",
  title="NDT of thick film resistors by noise spectroscopy",
  booktitle="Proceedings of 8th Conference STUDENT EEICT 2002",
  year="2002",
  number="1",
  pages="5",
  publisher="Ing. Zdeněk Novotný, CSc.",
  address="Brno",
  isbn="80-214-2115-0"
}