Detail publikace

Tailor-made plasma-polymerized tetravinylsilane

HOFEREK, L. TRIVEDI, R. KONTÁROVÁ, S. ČECH, V.

Originální název

Tailor-made plasma-polymerized tetravinylsilane

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Plasma polymer films of tetravinylsilane were deposited on silicon wafers using an RF glow discharge at a range of RF power (10-70 W). Spectroscopic techniques revealed that physico-chemical properties of plasma polymer depend on the RF power used if the flow rate was constant. An organic/inorganic character (C/Si ratio) of films and a content of vinyl groups could be controlled by the RF power. The refractive index of films increased with power from 1.7 (10 W) to 2.1 (70 W) at a wavelength of 633 nm and the extinction coefficient rose sharply with the power 0.18 (10 W)–0.30 (70 W) at a wavelength of 250 nm. The Youngs modulus and hardness of plasma polymer could be varied from 12 GPa (10 W) to 81 GPa (70 W) and from 0.84 to 8.8 GPa, respectively.

Klíčová slova

PECVD, tetravinylsilane, thin films

Autoři

HOFEREK, L.; TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.

Vydáno

31. 12. 2011

Strany od

1

Strany do

4

Strany počet

4

BibTex

@inproceedings{BUT89435,
  author="Lukáš {Hoferek} and Rutul Rajendra {Trivedi} and Soňa {Kontárová} and Vladimír {Čech}",
  title="Tailor-made plasma-polymerized tetravinylsilane",
  booktitle="ISPC20",
  year="2011",
  pages="1--4"
}