In-situ Monitoring of Thin Film Depositon Process Using Optical Emission Spectroscopy

článek ve sborníku ve WoS nebo Scopus

angličtina

Plasma enhanced chemical vapour deposition (PECVD) has become more and more popular for thin film deposition, especially using organosilicon precursors. This work focuses on high density films deposited by PECVD using hexamethyldisiloxane precursor. Optical emission spectroscopy was used for plasma diagnostics. Oxygen transmission rate and infrared spectra of deposited layers were measured. Optimal experimental conditions for low carbon content layers and layers with good barrier properties were determined.

PECVD, HMDSO, thin layers, barriere properties

PROCHÁZKA, M.; BLAHOVÁ, L.; KRČMA, F.; PŘIKRYL, R.

2012

10. 7. 2012

EPS

Lisbon

2-914771-74-6

Europhysics Conference Abstracts

36A

P3.5.71

P3.5.72

2