Detail publikace

Porous Silicon & Titanium Dioxide Coatings Prepared by Atmospheric Pressure Plasma Jet Chemical Vapour Deposition Technique - A Novel Coating Technology for Photovoltaic Modules

BHATT, S. PULPYTEL, J. KRČMA, F. MAZÁNKOVÁ, V. AREFI-KHONSARI, F.

Originální název

Porous Silicon & Titanium Dioxide Coatings Prepared by Atmospheric Pressure Plasma Jet Chemical Vapour Deposition Technique - A Novel Coating Technology for Photovoltaic Modules

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Atmospheric Pressure Plasma Jet (APPJ) is an alternative for wet processes used to make anti reflection coatings and smooth substrate surface for the PV module. It Is also an attractive technique because of it's high growth rate, low power consumption, lower cost and absence of high cost vacuum systems. This work deals with the deposition of silicon oxide from hexamethyldisiloxane (HMDSO) thin films and titanium dioxide from tetraisopropyl ortho titanate using an atmospheric pressure plasma jet (APPJ) system in open air conditions. A sinusoidal high voltage with a frequency between 19-23 kHz at power up to 1000 W was applied between two tubular electrodes separated by a dielectric material. The jet, characterized by Tg = 600-800K, was mostly laminar (Re = 1200) at the nozzle exit and became partially turbulent along the jet axis (Re = 3300). The spatially resolved mission spectra showed OH, N2, N2+ and CN molecular bands and O, H, N, Cu and Cr lines as well as the NO2 chemiluminescence continuum (450-800 nm). Thin films with good uniformity on the substrate were obtained at high deposition rate, between 800-1000 nm/s, and AFM results revealed that coatings are relatively smooth (Ra = 2 nm). The FTIR and SEM analyses were better used to monitor the chemical composition and the morphology of the films in function of the different experimental conditions.

Klíčová slova

porous SiO2, porous TiO2, atmospheric pressure plasma chemical vapour deposition (APCVD), high deposition rate

Autoři

BHATT, S.; PULPYTEL, J.; KRČMA, F.; MAZÁNKOVÁ, V.; AREFI-KHONSARI, F.

Rok RIV

2011

Vydáno

2. 12. 2011

ISSN

2077-6772

Periodikum

Journal of Nano- and Electronic Physics

Ročník

3

Číslo

1

Stát

Ukrajina

Strany od

1021

Strany do

1034

Strany počet

14

BibTex

@article{BUT96879,
  author="BHATT, S. and PULPYTEL, J. and KRČMA, F. and MAZÁNKOVÁ, V. and AREFI-KHONSARI, F.",
  title="Porous Silicon & Titanium Dioxide Coatings Prepared by Atmospheric Pressure Plasma Jet Chemical Vapour Deposition Technique - A Novel Coating Technology for Photovoltaic Modules",
  journal="Journal of Nano- and Electronic Physics",
  year="2011",
  volume="3",
  number="1",
  pages="1021--1034",
  issn="2077-6772"
}