Publication detail

Comparison of Aluminum Oxide Layers Deposited by PECVD and Pulsed Magnetron Sputtering for Dielectric Rear Side Passivation of Crystalline Silicon Solar Cells

HÉGR, O. ČECH, P. BAŘINKA, R. SOBOTA, J. KUSKO, M. KADLEC, S.

Original Title

Comparison of Aluminum Oxide Layers Deposited by PECVD and Pulsed Magnetron Sputtering for Dielectric Rear Side Passivation of Crystalline Silicon Solar Cells

Type

conference paper

Language

English

Original Abstract

The aim of our work is to test other alternative technologies available in the Solartec's research laboratory. There are a standard PECVD technology and a unique OKS („Otto Klobe und Sohn“) sputtering system, specially developed for photovoltaic applications. Sputtering system OKS is based on a batch process for 36 of 5“ Si substrates, where very good homogeneity of dielectric layers (2%) is achieved. OKS sputtering equipment was specially developed for the pilot plant in order to create a viable alternative to existing PECVD and opportunities for a wider use of the system, especially for the formation of multilayer dielectric films suitable for colored solar cells.

Keywords

solar cells, dielectric, passivation layer, aluminum oxide, reactive sputtering, PECVD

Authors

HÉGR, O.; ČECH, P.; BAŘINKA, R.; SOBOTA, J.; KUSKO, M.; KADLEC, S.

RIV year

2013

Released

1. 10. 2013

Publisher

WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG

Location

München, Germany

ISBN

3-936338-33-7

Book

Proceedings of 28th European Photovoltaic Solar Energy Conference and Exhibition

Edition number

1

Pages from

2047

Pages to

2049

Pages count

3

BibTex

@inproceedings{BUT103999,
  author="Ondřej {Hégr} and Pavel {Čech} and Radim {Bařinka} and Jaroslav {Sobota} and Martin {Kusko} and Stanislav {Kadlec}",
  title="Comparison of Aluminum Oxide Layers Deposited by PECVD and Pulsed Magnetron Sputtering for Dielectric Rear Side Passivation of Crystalline Silicon Solar Cells",
  booktitle="Proceedings of 28th European Photovoltaic Solar Energy Conference and Exhibition",
  year="2013",
  number="1",
  pages="2047--2049",
  publisher="WIP Wirtschaft und Infrastruktur GmbH & Co Planungs KG",
  address="München, Germany",
  doi="10.4229/28thEUPVSEC2013-2DV.4.21",
  isbn="3-936338-33-7"
}