Publication detail

Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering

DALLAEVA, D.

Original Title

Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering

Type

conference paper

Language

English

Original Abstract

AlN films were deposited by magnetron sputtering on the sapphire substrates. The dependence of films morphology on the substrate temperature is defined. The film is represented by well textured areas for higher substrate temperature during deposition process. Adhesion strength of particles and substrate depends on temperature. Increasing of temperature by heating the substrate is important parameter which intences the interaction in interface at the near-surface area.

Keywords

substrate, target, thin film, surface, roughness, atomic force microscopy

Authors

DALLAEVA, D.

RIV year

2014

Released

24. 4. 2014

Publisher

LITERA Brno

Location

Brno

ISBN

978-80-214-4922-0

Book

Proceedings of the 20th conference. Volume 3

Pages from

120

Pages to

124

Pages count

5

BibTex

@inproceedings{BUT107275,
  author="Dinara {Sobola}",
  title="Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering",
  booktitle="Proceedings of the 20th conference. Volume 3",
  year="2014",
  pages="120--124",
  publisher="LITERA Brno",
  address="Brno",
  isbn="978-80-214-4922-0"
}