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Publication detail
DALLAEVA, D.
Original Title
Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering
Type
conference paper
Language
English
Original Abstract
AlN films were deposited by magnetron sputtering on the sapphire substrates. The dependence of films morphology on the substrate temperature is defined. The film is represented by well textured areas for higher substrate temperature during deposition process. Adhesion strength of particles and substrate depends on temperature. Increasing of temperature by heating the substrate is important parameter which intences the interaction in interface at the near-surface area.
Keywords
substrate, target, thin film, surface, roughness, atomic force microscopy
Authors
RIV year
2014
Released
24. 4. 2014
Publisher
LITERA Brno
Location
Brno
ISBN
978-80-214-4922-0
Book
Proceedings of the 20th conference. Volume 3
Pages from
120
Pages to
124
Pages count
5
BibTex
@inproceedings{BUT107275, author="Dinara {Sobola}", title="Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering", booktitle="Proceedings of the 20th conference. Volume 3", year="2014", pages="120--124", publisher="LITERA Brno", address="Brno", isbn="978-80-214-4922-0" }