Detail publikace

Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering

DALLAEVA, D.

Originální název

Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

AlN films were deposited by magnetron sputtering on the sapphire substrates. The dependence of films morphology on the substrate temperature is defined. The film is represented by well textured areas for higher substrate temperature during deposition process. Adhesion strength of particles and substrate depends on temperature. Increasing of temperature by heating the substrate is important parameter which intences the interaction in interface at the near-surface area.

Klíčová slova

substrate, target, thin film, surface, roughness, atomic force microscopy

Autoři

DALLAEVA, D.

Rok RIV

2014

Vydáno

24. 4. 2014

Nakladatel

LITERA Brno

Místo

Brno

ISBN

978-80-214-4922-0

Kniha

Proceedings of the 20th conference. Volume 3

Strany od

120

Strany do

124

Strany počet

5

BibTex

@inproceedings{BUT107275,
  author="Dinara {Sobola}",
  title="Surface roughness of aluminum nitride epilayers prepared by magnetron sputtering",
  booktitle="Proceedings of the 20th conference. Volume 3",
  year="2014",
  pages="120--124",
  publisher="LITERA Brno",
  address="Brno",
  isbn="978-80-214-4922-0"
}