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PŘIKRYL, R. ČECH, V., HEDBAVNY, P., INAGAKI, N.
Original Title
Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films
Type
conference paper
Language
English
Original Abstract
A novel plasma reactor has been developed in scope of the joint Czech-Japan project. The plasma system is aimed at preparation of functionally nanostructured thin films of high reproducibility. Controlled deposition of the nanostructured films is a new technological step for creative design and application of complex film systems in smart materials. Functionally gradient and/or multilayered nanostructured thin films of continuously or quasi-continuously varying physicochemical properties are worthwhile as compatible interlayers among distinct materials.
Keywords
PE CVD, thin film, multilayer, gradient film
Authors
RIV year
2005
Released
12. 8. 2005
Publisher
Centre for Advanced coatings Technology, University of Toronto
Location
Toronto, Kanada
Pages from
1
Pages to
Pages count
6
BibTex
@inproceedings{BUT15156, author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}", title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films", booktitle="Proceedings of 17th symposium on plasma chemistry", year="2005", series="2005", pages="1--1", publisher="Centre for Advanced coatings Technology, University of Toronto", address="Toronto, Kanada" }