Detail publikace

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

PŘIKRYL, R. ČECH, V., HEDBAVNY, P., INAGAKI, N.

Originální název

Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

A novel plasma reactor has been developed in scope of the joint Czech-Japan project. The plasma system is aimed at preparation of functionally nanostructured thin films of high reproducibility. Controlled deposition of the nanostructured films is a new technological step for creative design and application of complex film systems in smart materials. Functionally gradient and/or multilayered nanostructured thin films of continuously or quasi-continuously varying physicochemical properties are worthwhile as compatible interlayers among distinct materials.

Klíčová slova

PE CVD, thin film, multilayer, gradient film

Autoři

PŘIKRYL, R. ČECH, V., HEDBAVNY, P., INAGAKI, N.

Rok RIV

2005

Vydáno

12. 8. 2005

Nakladatel

Centre for Advanced coatings Technology, University of Toronto

Místo

Toronto, Kanada

Strany od

1

Strany do

1

Strany počet

6

BibTex

@inproceedings{BUT15156,
  author="Radek {Přikryl} and Vladimír {Čech} and Pavel {Hedbavny} and Norihiro {Inagaki}",
  title="Novel plasma reactor with bottom rotary electrode for Plasma-enhanced chemical vapor deposition of nanostructured films",
  booktitle="Proceedings of 17th symposium on plasma chemistry",
  year="2005",
  series="2005",
  pages="1--1",
  publisher="Centre for Advanced coatings Technology, University of Toronto",
  address="Toronto, Kanada"
}