Publication detail

Chemical Vapour Deposition of Gas Sensitive Metal Oxides

VALLEJOS VARGAS, S. DI MAGGIO, F. SHUJAH, T. BLACKMAN, C.

Original Title

Chemical Vapour Deposition of Gas Sensitive Metal Oxides

Type

journal article in Web of Science

Language

English

Original Abstract

This article presents a review of recent research efforts and developments for the fabrication of metal-oxide gas sensors using chemical vapour deposition (CVD), presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance. Thin films typically have poorer gas sensing performance compared to traditional screen printed equivalents, attributed to reduced porosity, but the ability to integrate materials directly with the sensor platform provides important process benefits compared to competing synthetic techniques. We conclude that these advantages are likely to drive increased interest in the use of CVD for gas sensor materials over the next decade, whilst the ability to manipulate deposition conditions to alter microstructure can help mitigate the potentially reduced performance in thin films, hence the current prospects for use of CVD in this field look excellent.

Keywords

catalyst; CVD; nanoparticle; metal oxide; sensor; nano; chemical vapor deposition

Authors

VALLEJOS VARGAS, S.; DI MAGGIO, F.; SHUJAH, T.; BLACKMAN, C.

Released

1. 1. 2016

Publisher

MDPI

ISBN

2227-9040

Periodical

Chemosensors

Year of study

4

Number

1

State

Swiss Confederation

Pages from

1

Pages to

18

Pages count

18

URL

Full text in the Digital Library

BibTex

@article{BUT170140,
  author="Stella {Vallejos Vargas} and Francesco {Di Maggio} and Tahira {Shujah} and Chris {Blackman}",
  title="Chemical Vapour Deposition of Gas Sensitive Metal Oxides",
  journal="Chemosensors",
  year="2016",
  volume="4",
  number="1",
  pages="1--18",
  doi="10.3390/chemosensors4010004",
  issn="2227-9040",
  url="https://www.mdpi.com/2227-9040/4/1/4"
}