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VALLEJOS VARGAS, S. DI MAGGIO, F. SHUJAH, T. BLACKMAN, C.
Original Title
Chemical Vapour Deposition of Gas Sensitive Metal Oxides
Type
journal article in Web of Science
Language
English
Original Abstract
This article presents a review of recent research efforts and developments for the fabrication of metal-oxide gas sensors using chemical vapour deposition (CVD), presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance. Thin films typically have poorer gas sensing performance compared to traditional screen printed equivalents, attributed to reduced porosity, but the ability to integrate materials directly with the sensor platform provides important process benefits compared to competing synthetic techniques. We conclude that these advantages are likely to drive increased interest in the use of CVD for gas sensor materials over the next decade, whilst the ability to manipulate deposition conditions to alter microstructure can help mitigate the potentially reduced performance in thin films, hence the current prospects for use of CVD in this field look excellent.
Keywords
catalyst; CVD; nanoparticle; metal oxide; sensor; nano; chemical vapor deposition
Authors
VALLEJOS VARGAS, S.; DI MAGGIO, F.; SHUJAH, T.; BLACKMAN, C.
Released
1. 1. 2016
Publisher
MDPI
ISBN
2227-9040
Periodical
Chemosensors
Year of study
4
Number
1
State
Swiss Confederation
Pages from
Pages to
18
Pages count
URL
https://www.mdpi.com/2227-9040/4/1/4
Full text in the Digital Library
http://hdl.handle.net/11012/203113
BibTex
@article{BUT170140, author="Stella {Vallejos Vargas} and Francesco {Di Maggio} and Tahira {Shujah} and Chris {Blackman}", title="Chemical Vapour Deposition of Gas Sensitive Metal Oxides", journal="Chemosensors", year="2016", volume="4", number="1", pages="1--18", doi="10.3390/chemosensors4010004", issn="2227-9040", url="https://www.mdpi.com/2227-9040/4/1/4" }