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VALLEJOS VARGAS, S. DI MAGGIO, F. SHUJAH, T. BLACKMAN, C.
Originální název
Chemical Vapour Deposition of Gas Sensitive Metal Oxides
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
This article presents a review of recent research efforts and developments for the fabrication of metal-oxide gas sensors using chemical vapour deposition (CVD), presenting its potential advantages as a materials synthesis technique for gas sensors along with a discussion of their sensing performance. Thin films typically have poorer gas sensing performance compared to traditional screen printed equivalents, attributed to reduced porosity, but the ability to integrate materials directly with the sensor platform provides important process benefits compared to competing synthetic techniques. We conclude that these advantages are likely to drive increased interest in the use of CVD for gas sensor materials over the next decade, whilst the ability to manipulate deposition conditions to alter microstructure can help mitigate the potentially reduced performance in thin films, hence the current prospects for use of CVD in this field look excellent.
Klíčová slova
catalyst; CVD; nanoparticle; metal oxide; sensor; nano; chemical vapor deposition
Autoři
VALLEJOS VARGAS, S.; DI MAGGIO, F.; SHUJAH, T.; BLACKMAN, C.
Vydáno
1. 1. 2016
Nakladatel
MDPI
ISSN
2227-9040
Periodikum
Chemosensors
Ročník
4
Číslo
1
Stát
Švýcarská konfederace
Strany od
Strany do
18
Strany počet
URL
https://www.mdpi.com/2227-9040/4/1/4
Plný text v Digitální knihovně
http://hdl.handle.net/11012/203113
BibTex
@article{BUT170140, author="Stella {Vallejos Vargas} and Francesco {Di Maggio} and Tahira {Shujah} and Chris {Blackman}", title="Chemical Vapour Deposition of Gas Sensitive Metal Oxides", journal="Chemosensors", year="2016", volume="4", number="1", pages="1--18", doi="10.3390/chemosensors4010004", issn="2227-9040", url="https://www.mdpi.com/2227-9040/4/1/4" }