Publication detail

The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure

POLAT, Ö. COSKUN, M. EFEOGLU, H. CAGLAR, M. COSKUN, F. CAGLAR, Y. TURUT, A.

Original Title

The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure

Type

journal article in Web of Science

Language

English

Original Abstract

The perovskite ytterbium ferrite is a new ferroelectric semiconductor material. We presented the temperature induced current-voltage (I-V) characteristics of the Al/YbFeO3-delta/p-Si/Al hetero-junction. The orthoferrite YbFeO3-delta thin films were deposited on a single crystal p-type Si substrate by a radio frequency magnetron sputtering system. The potential barrier height (BH) and ideality factor n of the heterojunction were obtained by thermionic emission current method based on the recommendations in the literature. The fact that the calculated slopes of I-V curves become temperature independent implying that the field emission current mechanism takes place across the device, which has been explained by the presence of the spatial inhomogeneity of BHs or potential fluctuations. Moreover, a tunneling transmission coefficient value of 26.67 was obtained for the ferroelectric YbFeO3-delta layer at the Al/p-Si interface.

Keywords

perovskite oxide; YbFeO3; hetero-junction; current-voltage (I-V) characteristics; field emission

Authors

POLAT, Ö.; COSKUN, M.; EFEOGLU, H.; CAGLAR, M.; COSKUN, F.; CAGLAR, Y.; TURUT, A.

Released

20. 1. 2021

Publisher

IOP PUBLISHING LTD

Location

BRISTOL

ISBN

1361-648X

Periodical

Journal of Physics Condensed Matter

Year of study

33

Number

3

State

United Kingdom of Great Britain and Northern Ireland

Pages from

035704-1

Pages to

035704-13

Pages count

13

URL