Přístupnostní navigace
E-přihláška
Vyhledávání Vyhledat Zavřít
Detail publikace
POLAT, Ö. COSKUN, M. EFEOGLU, H. CAGLAR, M. COSKUN, F. CAGLAR, Y. TURUT, A.
Originální název
The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure
Typ
článek v časopise ve Web of Science, Jimp
Jazyk
angličtina
Originální abstrakt
The perovskite ytterbium ferrite is a new ferroelectric semiconductor material. We presented the temperature induced current-voltage (I-V) characteristics of the Al/YbFeO3-delta/p-Si/Al hetero-junction. The orthoferrite YbFeO3-delta thin films were deposited on a single crystal p-type Si substrate by a radio frequency magnetron sputtering system. The potential barrier height (BH) and ideality factor n of the heterojunction were obtained by thermionic emission current method based on the recommendations in the literature. The fact that the calculated slopes of I-V curves become temperature independent implying that the field emission current mechanism takes place across the device, which has been explained by the presence of the spatial inhomogeneity of BHs or potential fluctuations. Moreover, a tunneling transmission coefficient value of 26.67 was obtained for the ferroelectric YbFeO3-delta layer at the Al/p-Si interface.
Klíčová slova
perovskite oxide; YbFeO3; hetero-junction; current-voltage (I-V) characteristics; field emission
Autoři
POLAT, Ö.; COSKUN, M.; EFEOGLU, H.; CAGLAR, M.; COSKUN, F.; CAGLAR, Y.; TURUT, A.
Vydáno
20. 1. 2021
Nakladatel
IOP PUBLISHING LTD
Místo
BRISTOL
ISSN
1361-648X
Periodikum
Journal of Physics Condensed Matter
Ročník
33
Číslo
3
Stát
Spojené království Velké Británie a Severního Irska
Strany od
035704-1
Strany do
035704-13
Strany počet
13
URL
https://iopscience.iop.org/article/10.1088/1361-648X/abba69