Detail publikace

The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure

POLAT, Ö. COSKUN, M. EFEOGLU, H. CAGLAR, M. COSKUN, F. CAGLAR, Y. TURUT, A.

Originální název

The temperature induced current transport characteristics in the orthoferrite YbFeO3-delta thin film/p-type Si structure

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

The perovskite ytterbium ferrite is a new ferroelectric semiconductor material. We presented the temperature induced current-voltage (I-V) characteristics of the Al/YbFeO3-delta/p-Si/Al hetero-junction. The orthoferrite YbFeO3-delta thin films were deposited on a single crystal p-type Si substrate by a radio frequency magnetron sputtering system. The potential barrier height (BH) and ideality factor n of the heterojunction were obtained by thermionic emission current method based on the recommendations in the literature. The fact that the calculated slopes of I-V curves become temperature independent implying that the field emission current mechanism takes place across the device, which has been explained by the presence of the spatial inhomogeneity of BHs or potential fluctuations. Moreover, a tunneling transmission coefficient value of 26.67 was obtained for the ferroelectric YbFeO3-delta layer at the Al/p-Si interface.

Klíčová slova

perovskite oxide; YbFeO3; hetero-junction; current-voltage (I-V) characteristics; field emission

Autoři

POLAT, Ö.; COSKUN, M.; EFEOGLU, H.; CAGLAR, M.; COSKUN, F.; CAGLAR, Y.; TURUT, A.

Vydáno

20. 1. 2021

Nakladatel

IOP PUBLISHING LTD

Místo

BRISTOL

ISSN

1361-648X

Periodikum

Journal of Physics Condensed Matter

Ročník

33

Číslo

3

Stát

Spojené království Velké Británie a Severního Irska

Strany od

035704-1

Strany do

035704-13

Strany počet

13

URL