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HRDÝ, R. HUBÁLEK, J.
Original Title
Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique
Type
journal article - other
Language
English
Original Abstract
The porous alumina attracts attention because of its self-ordered hexagonal structure. It can be used as a template nanosize structure, for many devices such as magnetic, electronic and optoelectronic. The aim of this method is preparation of the mask for electrodepositing nanowires directly on Si substrate. The presented technique without utilization of high-resolution electron-beam lithographs belongs to low-cost technology in the microelectronic industry. Anodic alumina has been prepared in several electrolytes by the anodization process and the characteristics of pore structures have been studied in different anodizing conditions. The thickness of aluminum film for anodization was 1-2 um. The two methods for deposition of aluminum thin film on Si substrate are thermal evaporating and sputtering. The prepared alumina structures have 15-30 nm pore diameters and 30-110 nm interpore distances. The anodization of thin alumina film deposited on Si substrate is a complicated process in comparison with the anodization of aluminum sheet but the unique properties of this method are stability of the prepared structure and simple manipulation in other operations.
Keywords
pore alumina, anodization, sputtered, nanocrystal
Authors
HRDÝ, R.; HUBÁLEK, J.
RIV year
2007
Released
1. 2. 2007
Publisher
Hutnická fakulta Technickej univerzity
Location
Košice
ISBN
1335-1532
Periodical
Acta Metallurgica Slovaca
Year of study
13
Number
2
State
Slovak Republic
Pages from
155
Pages to
158
Pages count
4
BibTex
@article{BUT44513, author="Radim {Hrdý} and Jaromír {Hubálek}", title="Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique", journal="Acta Metallurgica Slovaca", year="2007", volume="13", number="2", pages="155--158", issn="1335-1532" }