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HRDÝ, R. HUBÁLEK, J.
Originální název
Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
The porous alumina attracts attention because of its self-ordered hexagonal structure. It can be used as a template nanosize structure, for many devices such as magnetic, electronic and optoelectronic. The aim of this method is preparation of the mask for electrodepositing nanowires directly on Si substrate. The presented technique without utilization of high-resolution electron-beam lithographs belongs to low-cost technology in the microelectronic industry. Anodic alumina has been prepared in several electrolytes by the anodization process and the characteristics of pore structures have been studied in different anodizing conditions. The thickness of aluminum film for anodization was 1-2 um. The two methods for deposition of aluminum thin film on Si substrate are thermal evaporating and sputtering. The prepared alumina structures have 15-30 nm pore diameters and 30-110 nm interpore distances. The anodization of thin alumina film deposited on Si substrate is a complicated process in comparison with the anodization of aluminum sheet but the unique properties of this method are stability of the prepared structure and simple manipulation in other operations.
Klíčová slova
pore alumina, anodization, sputtered, nanocrystal
Autoři
HRDÝ, R.; HUBÁLEK, J.
Rok RIV
2007
Vydáno
1. 2. 2007
Nakladatel
Hutnická fakulta Technickej univerzity
Místo
Košice
ISSN
1335-1532
Periodikum
Acta Metallurgica Slovaca
Ročník
13
Číslo
2
Stát
Slovenská republika
Strany od
155
Strany do
158
Strany počet
4
BibTex
@article{BUT44513, author="Radim {Hrdý} and Jaromír {Hubálek}", title="Using a Porous Alumina Film as a Mask for Formation of Ordered Nanostructures by Deposition Technique", journal="Acta Metallurgica Slovaca", year="2007", volume="13", number="2", pages="155--158", issn="1335-1532" }