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TRIVEDI, R. KONTÁROVÁ, S. ČECH, V.
Original Title
Plasma-enhanced chemical vapor deposition of nanocomposite thin films
Type
abstract
Language
English
Original Abstract
The deposited films at a power of 10 W (self-bias 120 V) were of grain structure with a diameter of grains 20-100 nm. The diameter of some grains increased up to 0.5 micron with en-hanced power at an expense of smaller ones, whose magnitude decreased.
Keywords
PECVD, nanocomposite, AFM, nanoindentaion
Authors
TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.
Released
27. 12. 2010
Pages from
1
Pages to
Pages count
BibTex
@misc{BUT60976, author="Rutul Rajendra {Trivedi} and Soňa {Kontárová} and Vladimír {Čech}", title="Plasma-enhanced chemical vapor deposition of nanocomposite thin films", booktitle="PSE 2010", year="2010", edition="1", pages="1--1", note="abstract" }