Detail publikace

Plasma-enhanced chemical vapor deposition of nanocomposite thin films

TRIVEDI, R. KONTÁROVÁ, S. ČECH, V.

Originální název

Plasma-enhanced chemical vapor deposition of nanocomposite thin films

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

The deposited films at a power of 10 W (self-bias 120 V) were of grain structure with a diameter of grains 20-100 nm. The diameter of some grains increased up to 0.5 micron with en-hanced power at an expense of smaller ones, whose magnitude decreased.

Klíčová slova

PECVD, nanocomposite, AFM, nanoindentaion

Autoři

TRIVEDI, R.; KONTÁROVÁ, S.; ČECH, V.

Vydáno

27. 12. 2010

Strany od

1

Strany do

1

Strany počet

1

BibTex

@misc{BUT60976,
  author="Rutul Rajendra {Trivedi} and Soňa {Kontárová} and Vladimír {Čech}",
  title="Plasma-enhanced chemical vapor deposition of nanocomposite thin films",
  booktitle="PSE 2010",
  year="2010",
  edition="1",
  pages="1--1",
  note="abstract"
}