Publication detail
Application of TOF - LEIS and XPS for Surface Studies.
PRŮŠA, S., ŠIKOLA, T., SPOUSTA, J., VOBORNÝ, S., BÁBOR, P., JURKOVIČ, P., ČECHAL, J.
Original Title
Application of TOF - LEIS and XPS for Surface Studies.
Type
conference paper
Language
English
Original Abstract
In the contribution complementary experiments on analysis of surfaces using time-of-flight low energy ion scattering (TOF-LEIS) and x-ray photoelectron spectroscopy (XPS) will be presented. The attention will be paid both to analysis of surfaces and ultra-thin films (e.g. Ga) prepared in situ under UHV conditions. The advantages of simultaneous application of two complementary techniques to surface analysis will be clearly demonstrated.
Key words in English
SIMS, TOF
Authors
PRŮŠA, S., ŠIKOLA, T., SPOUSTA, J., VOBORNÝ, S., BÁBOR, P., JURKOVIČ, P., ČECHAL, J.
RIV year
2002
Released
27. 6. 2001
Publisher
Vutium
Location
Brno
ISBN
80-214-1892-3
Book
Materials Structure & Micromechanics of Fracture (MSMF-3)
Pages from
486
Pages to
493
Pages count
8
BibTex
@{BUT69583
}