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STUDÝNKA, J. ČECH, V.
Original Title
Aging of silicon-based dielectric coatings deposited by plasma polymerization
Type
journal article - other
Language
English
Original Abstract
Silicon-based dielectric coatings were deposited from tetravinylsilane or a mixture of tetravinylsilane with oxygen gas by pulsed plasma. The coatings in the form of a-SiC:H or a-SiOC:H alloy were stored at ambient conditions for 800 h to investigate aging effects. The SiH, SiC, and CHx species in the plasma polymer film were identified as responsible for strong oxidation of the deposited material. The increased oxygen concentration up to 19 at.% in the dielectric coatings resulted in a decrease of the refractive index. Oxygen concentrations 10 at.% resulted in reduction of mechanical properties of dielectric coatings deposited at powers 2.5 W. Suitable deposition conditions were deduced to reduce aging effects.
Keywords
Thin film; PECVD; Aging; FTIR, Ellipsometry
Authors
STUDÝNKA, J.; ČECH, V.
RIV year
2011
Released
31. 12. 2011
ISBN
0040-6090
Periodical
Thin Solid Films
Year of study
519
Number
7
State
Kingdom of the Netherlands
Pages from
2168
Pages to
2171
Pages count
4
BibTex
@article{BUT89391, author="Jan {Studýnka} and Vladimír {Čech}", title="Aging of silicon-based dielectric coatings deposited by plasma polymerization", journal="Thin Solid Films", year="2011", volume="519", number="7", pages="2168--2171", issn="0040-6090" }