Detail publikace

Aging of silicon-based dielectric coatings deposited by plasma polymerization

STUDÝNKA, J. ČECH, V.

Originální název

Aging of silicon-based dielectric coatings deposited by plasma polymerization

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Silicon-based dielectric coatings were deposited from tetravinylsilane or a mixture of tetravinylsilane with oxygen gas by pulsed plasma. The coatings in the form of a-SiC:H or a-SiOC:H alloy were stored at ambient conditions for 800 h to investigate aging effects. The SiH, SiC, and CHx species in the plasma polymer film were identified as responsible for strong oxidation of the deposited material. The increased oxygen concentration up to 19 at.% in the dielectric coatings resulted in a decrease of the refractive index. Oxygen concentrations 10 at.% resulted in reduction of mechanical properties of dielectric coatings deposited at powers 2.5 W. Suitable deposition conditions were deduced to reduce aging effects.

Klíčová slova

Thin film; PECVD; Aging; FTIR, Ellipsometry

Autoři

STUDÝNKA, J.; ČECH, V.

Rok RIV

2011

Vydáno

31. 12. 2011

ISSN

0040-6090

Periodikum

Thin Solid Films

Ročník

519

Číslo

7

Stát

Nizozemsko

Strany od

2168

Strany do

2171

Strany počet

4

BibTex

@article{BUT89391,
  author="Jan {Studýnka} and Vladimír {Čech}",
  title="Aging of silicon-based dielectric coatings deposited by plasma polymerization",
  journal="Thin Solid Films",
  year="2011",
  volume="519",
  number="7",
  pages="2168--2171",
  issn="0040-6090"
}