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STUDÝNKA, J. ČECH, V.
Originální název
Aging of silicon-based dielectric coatings deposited by plasma polymerization
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Silicon-based dielectric coatings were deposited from tetravinylsilane or a mixture of tetravinylsilane with oxygen gas by pulsed plasma. The coatings in the form of a-SiC:H or a-SiOC:H alloy were stored at ambient conditions for 800 h to investigate aging effects. The SiH, SiC, and CHx species in the plasma polymer film were identified as responsible for strong oxidation of the deposited material. The increased oxygen concentration up to 19 at.% in the dielectric coatings resulted in a decrease of the refractive index. Oxygen concentrations 10 at.% resulted in reduction of mechanical properties of dielectric coatings deposited at powers 2.5 W. Suitable deposition conditions were deduced to reduce aging effects.
Klíčová slova
Thin film; PECVD; Aging; FTIR, Ellipsometry
Autoři
STUDÝNKA, J.; ČECH, V.
Rok RIV
2011
Vydáno
31. 12. 2011
ISSN
0040-6090
Periodikum
Thin Solid Films
Ročník
519
Číslo
7
Stát
Nizozemsko
Strany od
2168
Strany do
2171
Strany počet
4
BibTex
@article{BUT89391, author="Jan {Studýnka} and Vladimír {Čech}", title="Aging of silicon-based dielectric coatings deposited by plasma polymerization", journal="Thin Solid Films", year="2011", volume="519", number="7", pages="2168--2171", issn="0040-6090" }