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ČECH, V.
Original Title
Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys
Type
lecture
Language
English
Original Abstract
Plasma polymer films were deposited from organosilicon monomers (hexamethyldisiloxane, vinyltriethoxysilane, and tetra-vinylsilane (pure or in a mixture with oxygen gas) by pulsed plasma at different power (0.05–40 W). The deposited materials in the form of hydrogenated amorphous carbon-silicon oxide (a-SiOC:H) alloy are discussed with respect to their chemical, optical, mechanical, and surface properties controlled by pulsed plasma.
Keywords
thin films, PECVD
Authors
Released
26. 7. 2012
Location
Tatung University, Taipei, Taiwan
BibTex
@misc{BUT97298, author="Vladimír {Čech}", title="Pulsed Plasma Used to Control Properties of a-SiOC:H Alloys", year="2012", address="Tatung University, Taipei, Taiwan", note="lecture" }