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MOZALEV, A. HUBALEK, J.
Product type
funkční vzorek
Abstract
Three types of thin solid films with the nanoscale inner structures were synthesized by sputtering-deposition and anodizing of Al layer, Al 1.5 at.% Si alloy layer, and Al/Ta bilayer on Si wafers. All the anodic films comprised 1 um thick nanoporous alumina layer as the key component. The essential differences were due to the silicon impurities (AlSi alloy) and the array of nanosized tantalum oxide protrusions in the alumina barrier layer (Al/Ta bilayer).
Keywords
porous alumina; tantalum oxide; nanostructure; dielectric properties; electric polarization; integral capacitors; high-frequency performance
Create date
31. 7. 2012
Location
LabSensNano, SIX, UMEL
Possibilities of use
Využití výsledku jiným subjektem je možné bez nabytí licence (výsledek není licencován)
Licence fee
Poskytovatel licence na výsledek nepožaduje licenční poplatek
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http://www.umel.feec.vutbr.cz/LabSensNano/Products.aspx