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RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Original Title
Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films
Type
conference paper
Language
English
Original Abstract
The spectroscopic studies have been focused on the basic characterization of the RF discharge conditions during the films deposition. In the discharge spectra many different species has been determined. To characterize the neutral gas temperature the small amount of nitrogen has been involved into the discharge. The dependencies of the temperature and the molecular excitations in the discharge have been initially studied on the total discharge power and gas composition. The correlation among the discharge parameters and the final layer properties will be subject of the following studies.
Keywords
Low temperature plasma deposition, Optical emission spectroscopy
Authors
RIV year
2003
Released
1. 4. 2003
Publisher
Universita Bari
Location
Bari
Pages from
214
Pages to
217
Pages count
4
BibTex
@inproceedings{BUT8827, author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}", title="Spectroscopic Observation of Plasma Deposition of Thin Silane and Siloxane Based Films", booktitle="Proceedings of Frontiers in Low Temperature Plasma Diagnostics V", year="2003", number="1", pages="4", publisher="Universita Bari", address="Bari" }