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AUBRECHT, V., BARTLOVÁ, M.
Originální název
Influence of Cu Vapour on Radiation in SF6 Arc Plasma
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Comparisons of radiation in pure SF6 and SF6 + Cu arc plasmas predicted using the method of partial characteristics have been performed at a pressure of 0.5 MPa. Admixture of Cu vapour in SF6 contributes to the net emission increasing. The contribution depends on the Cu vapour concentration. If there is 1% of Cu in SF6 plasma, net emission in the arc centre is about 3% higher. In case of higher concentration of Cu (10% Cu in SF6), the central net emission rises up to 20%. In the outer parts of the arc plasma with predomination of self-absorption the effect of Cu admixture is negligible.
Klíčová slova v angličtině
Plasma radiation, SF6, partial characteristics
Autoři
Rok RIV
2003
Vydáno
13. 1. 2003
Nakladatel
Department of Plasma Physics & Institute of Physics at Comenius University
Místo
Liptovský Mikuláš
ISBN
80-8040-195-0
Kniha
Proceedings of the XIVth Symposium on Application of Plasma Processes (SAPP XIV)
Strany od
5
Strany do
6
Strany počet
2
BibTex
@inproceedings{BUT10105, author="Vladimír {Aubrecht} and Milada {Bartlová}", title="Influence of Cu Vapour on Radiation in SF6 Arc Plasma", booktitle="Proceedings of the XIVth Symposium on Application of Plasma Processes (SAPP XIV)", year="2003", pages="5--6", publisher="Department of Plasma Physics & Institute of Physics at Comenius University", address="Liptovský Mikuláš", isbn="80-8040-195-0" }