Optimization of Surface Texturing in the Solar Cells Production

článek ve sborníku ve WoS nebo Scopus

angličtina

This article deals with implementation of the Atomic Force Microscopy (AFM) Atomic Force Microscopy to characterisation process of crystalline silicon solar cells texture. Aim of this work was to create methodology for surface evaluation in terms of optimization of texturing process in solar cells mass-production. A detailed description of surface structure is based on inspection of roughness parameters. When monitoring surface properties the AFM method has clear advantages compared to optical microscopy. Silicon substrates used in experiment were etched in strong and weak alkaline as well as in in acid solutions. Set pProcess conditions and etching solution composition affect quality of created structure very significantly – especially texture depth, size of etched objects and amount of underetching. To obtain clear depiction of final surface structure the size of scanned area was 50 x 50 um. The shape and the depth analysis of etched objects were completed by root mean square deviation of roughness, root mean square deviation of waviness and root mean square slope of roughness. These parameters, determined by analysis made by the Gwyddion program, enable detailed characterization of surface and they are closely related with final optical properties of the substrate. Based on the measurements a methodology for assessment of silicon surface properties after etching process was suggested. This method allows obtain a description of different morphologies of selected surfaces and its dependence on process conditions. Investigated samples were characterized using the NTEGRA Prima microscope. Experiments were carried out in laboratories of Solartec s.r.o.

AFM, solar cell, texture

MOJROVÁ, B.; BOUŠEK, J.; HOFMAN, J.; HÉGR, O.; BAŘINKA, R.; BAŘINKOVÁ, P.

2014

25. 6. 2014

Vysoké učení technické v Brně

978-80-214-4985-5

EDS 14 Imaps Cs International Conference Proceedings

11

14

150