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ŠÍR, M. FEŇO, I.
Originální název
MEASUREMENT METHOD FOR THE DYNAMIC ON-STATE RESISTANCE OF GAN SEMICONDUCTORS
Typ
článek ve sborníku ve WoS nebo Scopus
Jazyk
angličtina
Originální abstrakt
Defects in material structure effects the ON-state resistance of GaN devices, which can’t be considered constant in power loss evaluation when considering high operating frequency. The aim of this article is to propose a novel method to measure the dynamic RDSon. The method resolves a typical disadvantage of former methods e.g. an unclear clamping diode voltage drop in former approaches. Test results obtained with the new method are presented for 3 samples provided by different suppliers. Results shows that each sample exhibits a different dynamic RDSon characteristics what indicates a different process technology used to manufacture the device.
Klíčová slova
GaN semiconductor, Novel RDSon Measurement method, Dynamic On state resistance, Dynamic RDSon
Autoři
ŠÍR, M.; FEŇO, I.
Vydáno
25. 11. 2019
Nakladatel
IEEE
Místo
2018 2nd European Conference on Electrical Engineering and Computer Science (EECS)
ISBN
978-1-7281-1929-8
Kniha
Strany od
543
Strany do
546
Strany počet
4
URL
https://ieeexplore.ieee.org/document/8910040
BibTex
@inproceedings{BUT155364, author="ŠÍR, M. and FEŇO, I.", title="MEASUREMENT METHOD FOR THE DYNAMIC ON-STATE RESISTANCE OF GAN SEMICONDUCTORS", booktitle="2018 2nd European Conference on Electrical Engineering and Computer Science (EECS)", year="2019", pages="543--546", publisher="IEEE", address="2018 2nd European Conference on Electrical Engineering and Computer Science (EECS)", doi="10.1109/EECS.2018.00106", isbn="978-1-7281-1929-8", url="https://ieeexplore.ieee.org/document/8910040" }