Detail publikace

Fragmentation of Tetravinyl Silane in Pulsed RF Discharge

KRČMA, F. FLAMÍKOVÁ, K. STUDÝNKA, J.

Originální název

Fragmentation of Tetravinyl Silane in Pulsed RF Discharge

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The tetravinylsilane fragmentation was studied in pulsed regime of RF discharge by optical emission spectroscopy. Some simple fragments were recognized. The emission intensities of these fragments were strongly dependent on the duty cycle of the discharge. The electron and rotational temperatures were calculated from the spectra and both of them also depended on the duty cycle. The determined electron temperature of about 3500 K was very low in comparison to the energy needed for the tetravinylsilane fragmentation (about 10 eV) and only a few electrons had sufficient energy for the fragmentation. Thus we suppose that excited states play a significant role in the fragmentation process.

Klíčová slova

pulsed RF discharge, tetravinylsilane, fragmentation, optical emission spectroscopy

Autoři

KRČMA, F.; FLAMÍKOVÁ, K.; STUDÝNKA, J.

Rok RIV

2009

Vydáno

17. 1. 2009

Nakladatel

UK Bratislava

Místo

Bratislava

ISBN

978-80-89186-45-7

Kniha

Proceedings of 17th Symposium on Application of Plasma Processes

Strany od

285

Strany do

286

Strany počet

2

BibTex

@inproceedings{BUT29624,
  author="František {Krčma} and Kristýna {Flamíková} and Jan {Studýnka}",
  title="Fragmentation of Tetravinyl Silane in Pulsed RF Discharge",
  booktitle="Proceedings of 17th Symposium on Application of Plasma Processes",
  year="2009",
  pages="285--286",
  publisher="UK Bratislava",
  address="Bratislava",
  isbn="978-80-89186-45-7"
}