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ČECH, V. ČECHALOVÁ, B. TRIVEDI, R. STUDÝNKA, J.
Originální název
Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry
Typ
článek v časopise - ostatní, Jost
Jazyk
angličtina
Originální abstrakt
Well-defined single layer and multilayered a-SiC:H films, deposited from tetravinylsilane at different powers by plasma-enhanced chemical vapor deposition on silicon, were intensively studied by in situ spectroscopic ellipsometry, nanoindentation, and atomic force microscopy. A realistic model of the sample structure was used to analyze ellipsometric data and distinguish individual layers in the multilayered film, evaluate their thickness and optical constants. Dispersion dependences for the refractive index were well separated for each type of individual layer, if the thickness was decreased 315 - 25 nm, and corresponded to those of the single layer. A beveled section of the multilayered film revealed the individual layers that were investigated by atomic force microscopy and nanoindentation to confirm that mechanical properties in multilayered and single layer films are similar.
Klíčová slova
Multilayers; Plasma processing and deposition; Ellipsometry; Atomic force microscopy (AFM)
Autoři
ČECH, V.; ČECHALOVÁ, B.; TRIVEDI, R.; STUDÝNKA, J.
Rok RIV
2009
Vydáno
22. 12. 2009
ISSN
0040-6090
Periodikum
Thin Solid Films
Ročník
517
Číslo
21
Stát
Nizozemsko
Strany od
6034
Strany do
6037
Strany počet
4
BibTex
@article{BUT47020, author="Vladimír {Čech} and Božena {Čechalová} and Rutul Rajendra {Trivedi} and Jan {Studýnka}", title="Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry", journal="Thin Solid Films", year="2009", volume="517", number="21", pages="6034--6037", issn="0040-6090" }