Detail publikace

Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry

ČECH, V. ČECHALOVÁ, B. TRIVEDI, R. STUDÝNKA, J.

Originální název

Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Well-defined single layer and multilayered a-SiC:H films, deposited from tetravinylsilane at different powers by plasma-enhanced chemical vapor deposition on silicon, were intensively studied by in situ spectroscopic ellipsometry, nanoindentation, and atomic force microscopy. A realistic model of the sample structure was used to analyze ellipsometric data and distinguish individual layers in the multilayered film, evaluate their thickness and optical constants. Dispersion dependences for the refractive index were well separated for each type of individual layer, if the thickness was decreased 315 - 25 nm, and corresponded to those of the single layer. A beveled section of the multilayered film revealed the individual layers that were investigated by atomic force microscopy and nanoindentation to confirm that mechanical properties in multilayered and single layer films are similar.

Klíčová slova

Multilayers; Plasma processing and deposition; Ellipsometry; Atomic force microscopy (AFM)

Autoři

ČECH, V.; ČECHALOVÁ, B.; TRIVEDI, R.; STUDÝNKA, J.

Rok RIV

2009

Vydáno

22. 12. 2009

ISSN

0040-6090

Periodikum

Thin Solid Films

Ročník

517

Číslo

21

Stát

Nizozemsko

Strany od

6034

Strany do

6037

Strany počet

4

BibTex

@article{BUT47020,
  author="Vladimír {Čech} and Božena {Čechalová} and Rutul Rajendra {Trivedi} and Jan {Studýnka}",
  title="Single layer and multilayered films of plasma polymers analyzed by nanoindentation and spectroscopic ellipsometry",
  journal="Thin Solid Films",
  year="2009",
  volume="517",
  number="21",
  pages="6034--6037",
  issn="0040-6090"
}