Detail publikace

Protective layers on Ni-based superalloys formed by co-deposition of Al and Si

POSPÍŠILOVÁ, S. KREJČÍ, J. PODRÁBSKÝ, T. ČELKO, L.

Originální název

Protective layers on Ni-based superalloys formed by co-deposition of Al and Si

Typ

abstrakt

Jazyk

angličtina

Originální abstrakt

Co-deposition of Al and Si on nickel-based superalloys (Inconel 713LC and Inconel 738LC) is being studied by means of light and scanning electron microscope equipped for EDS microanalysis. After "painting" the substrate with colloidal fluid containing Al and Si particles, diffusion annealing follows (the method was developed in former Soviet Union for military aircraft engines). Surface layer affected by diffusion of Al and Si splits into two sub-layers, Al rich and Si rich. Final structure is formed (from surface to the substrate) by oxide film (Al2O3 + Cr2O3), Al rich region, Si rich region and substrate deficient in Al and therefore free of Ni3Al particles. To obtain composition of surface proper and details in immediately adjacent material, EDS analysis using decreasing acceleration voltage (AV) in SEM, was employed. This measurements made it possible to, through extrapolation of measured curves to 0 kV AV, obtain composition of surface film (oxides) and composition changes in material closest to the surface.

Klíčová slova

Al-Si layers, Inconel, EDS

Autoři

POSPÍŠILOVÁ, S.; KREJČÍ, J.; PODRÁBSKÝ, T.; ČELKO, L.

Rok RIV

2006

Vydáno

1. 6. 2006

Nakladatel

RMS Royal Microscopical Society

Místo

RMS Royal Microscopical Society, 37/38 St.Clements, Oxford OX4 IAJ, UK

Strany od

47

Strany do

47

Strany počet

1

BibTex

@misc{BUT61018,
  author="Simona {Hutařová} and Jan {Krejčí} and Tomáš {Podrábský} and Ladislav {Čelko}",
  title="Protective layers on Ni-based superalloys formed by co-deposition of Al and Si",
  booktitle="Microscience 2006",
  year="2006",
  series="2006",
  edition="1",
  pages="47--47",
  publisher="RMS Royal Microscopical Society",
  address="RMS Royal Microscopical Society, 37/38 St.Clements, Oxford OX4 IAJ, UK",
  note="abstract"
}