Detail publikace

Mechanical properties of individual layers in a-SiC:H multilayer film

ČECH, V. TRIVEDI, R. ŠKODA, D.

Originální název

Mechanical properties of individual layers in a-SiC:H multilayer film

Typ

článek v časopise - ostatní, Jost

Jazyk

angličtina

Originální abstrakt

Hydrogenated amorphous carbon-silicon (a-SiC:H) multilayer film consisting of five soft bilayers (layer A: E=15.4 GPa, H=1.69 GPa; layer B: E=9.63 GPa, H=0.94 GPa) was deposited from tetravinylsilane monomer at two RF powers (10 W, 0.1 W) on silicon wafer by plasma-enhanced chemical vapor deposition. The multilayer comprising ten layers of 0.13-micron thickness was sectioned at a shallow angle of 4 deg by ultramicrotomy to reveal the individual layers. The layers in the multilayer film were distinguished by the surface topography mode of semicontact atomic force microscopy utilizing the step character in height corresponding to the stiffness of the individual layers and by atomic force acoustic microscopy (AFAM) utilizing the distribution of resonant frequencies corresponding to elastic anisotropy. The sectioned individual layers were sufficiently smooth (RMS roughness: 0.001 micron) to make nanoindentation measurements for each layer. The Youngs modulus E and hardness H were determined for individual layers, enabling us to distinguish a stiffer layer A from a more pliant layer B. An influence of the surrounding layers and substrate on the determined mechanical constants was discussed as well.

Klíčová slova

atomic force microscopy (AFM); mechanical properties; multilayers; nanoindentation; plasma-enhanced chemical vapor deposition (PECVD)

Autoři

ČECH, V.; TRIVEDI, R.; ŠKODA, D.

Rok RIV

2011

Vydáno

31. 12. 2011

ISSN

1612-8850

Periodikum

Plasma Processes and Polymers

Ročník

8

Číslo

12

Stát

Spolková republika Německo

Strany od

1107

Strany do

1115

Strany počet

9

BibTex

@article{BUT89431,
  author="Vladimír {Čech} and Rutul Rajendra {Trivedi} and David {Škoda}",
  title="Mechanical properties of individual layers in a-SiC:H multilayer film",
  journal="Plasma Processes and Polymers",
  year="2011",
  volume="8",
  number="12",
  pages="1107--1115",
  issn="1612-8850"
}