Detail publikace

Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate

HRDÝ, R., HUBÁLEK, J.

Originální název

Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

The purpose of our method is creating a template for electro deposition of nanowires directly on n-type Si substrate. The thickness of aluminum layer is 1-2 um. The first task was to find an efficient method for deposition of thin alumina film. The sputtering was found to be unsuitable for anodization process because nanocrytals had been created during the deposition of film. The creating of ordered pore structure failed. We found conditions in which aluminum layer is not dissolved during anodization before than pore structure is created.

Klíčová slova

self-ordering, nanopores, anodization

Autoři

HRDÝ, R., HUBÁLEK, J.

Rok RIV

2005

Vydáno

15. 9. 2005

Nakladatel

Ing. Zdeněk Novoný, CSc.

ISBN

80-214-2990-9

Kniha

Electronic Devices and Systems IMAPS CS International Conference 2005

Číslo edice

1

Strany od

300

Strany do

303

Strany počet

4

BibTex

@inproceedings{BUT15946,
  author="Radim {Hrdý} and Jaromír {Hubálek}",
  title="Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate",
  booktitle="Electronic Devices and Systems IMAPS CS International Conference 2005",
  year="2005",
  number="1",
  pages="4",
  publisher="Ing. Zdeněk Novoný, CSc.",
  isbn="80-214-2990-9"
}