Detail publikace

Nanometer - Thick titanium film as a silicon migration barrier

FAWAEER, S. AL-QAISI, W. SEDLÁKOVÁ, V. TRUNEC, M. SOBOLA, D. MOUSA, M.

Originální název

Nanometer - Thick titanium film as a silicon migration barrier

Typ

článek v časopise ve Web of Science, Jimp

Jazyk

angličtina

Originální abstrakt

Diffusion of silicon atoms to the topmost film surface poses significant challenges in various technological applications. In an effort to address this issue, titanium films with varying thicknesses were deposited on a silicon substrate to evaluate the efficacy of a thin titanium barrier film in blocking silicon migration to the upper film surface. Subsequently, the films were subjected to a 1-hour heating process in air at an oxidizing temperature of 430 K. Atomic force microscopy and Raman spectroscopy were employed to characterize the morphological and structural changes among the investigated films. X-ray photoelectron spectroscopy was utilized to explore variations in chemical composition, determine oxidation states, and measure the thicknesses of the thin titanium oxide layers. The findings revealed that titanium films with a thickness < 50 nm experienced silicon diffusion to their upper film surface. Moreover, an increase in the thickness of the oxide layers over the titanium film on the silicon substrate significantly reduced the migration of silicon to the titanium film surface. At 430 K, the study found that oxide layers at least 6.87 nm thick formed on a 35-nm thick titanium layer, which together successfully prevented silicon migration to the top surface of the film.

Klíčová slova

Diffusion barrier; Migration barrier; Silicon substrate; Titanium film; Titanium oxide film layer

Autoři

FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; TRUNEC, M.; SOBOLA, D.; MOUSA, M.

Vydáno

1. 8. 2024

Nakladatel

ELSEVIER

Místo

AMSTERDAM

ISSN

2352-4928

Periodikum

Materials Today Communications

Ročník

40

Číslo

August 2024

Stát

Spojené království Velké Británie a Severního Irska

Strany od

1

Strany do

17

Strany počet

17

URL

https://www.sciencedirect.com/science/article/pii/S2352492824013072

BibTex

@article{BUT189885,
  author="Saleh Hekmat Saleh {Fawaeer} and Wala' {Al-Qaisi} and Vlasta {Sedláková} and Marwan S. Mousa {Mousa} and Martin {Trunec} and Dinara {Sobola}",
  title="Nanometer - Thick titanium film as a silicon migration barrier",
  journal="Materials Today Communications",
  year="2024",
  volume="40",
  number="August 2024",
  pages="1--17",
  doi="10.1016/j.mtcomm.2024.109326",
  issn="2352-4928",
  url="https://www.sciencedirect.com/science/article/pii/S2352492824013072"
}